Surface condition measuring apparatus
专利汇可以提供Surface condition measuring apparatus专利检索，专利查询，专利分析的服务。并且PURPOSE:To enable a higher rate of separation and detection of a foreign matter for a circuit pattern, by selectively receiving scattered luminous fluxes from the foreign matter existing on a substrate, avoiding diffraction light in a spatial layout. CONSTITUTION:A polygon mirror 2 and a projection section 4 composes a part of a projection means. A mirror 2 is rotated to scan a circuit board 5 with a luminous flux made incident from slantly above. A focusing section 6 is provided on the incident side with respect to a normal on an incident surface of the circuit board 5 to focus scattered luminous flux from the foreign matter located on the circuit board 5, then, at the point PG through a mirror 7 and introduced to a light receiving surface 9 with a lens 8. On the other hand, the line connecting an intersection 71 on the extension of an optical axis 81 with the mirror 5 and an intersection 0 on the circuit board 5 gives an optical axis point 0 and the reflection point Pg of the mirror 2 an optical axis of a projector section 5. Here, it is so arranged that the focusing section 6 is shifted by an angle lest a projection image to the circuit board 5 of the optical axis thereof should coincide with the direction of a diffraction light generated from a main pattern on the circuit board 5. This enables higher separate detection rate of a foreign matter.，下面是Surface condition measuring apparatus专利的具体信息内容。
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