摘要 |
PURPOSE:To engrave a type having a taper bottom in a metal material, by etching the metal material with use of a double pattern provided on the type forming surface thereof as a mask. CONSTITUTION:A first photo-resist pattern 211 corresponding to a print 111 to be engraved in shape and a second photo-resist pattern 212 surrounding the outer circumference thereof with the pattern parallel to the outline thereof, are provided on the same type forming surface of a metal material 11' spaced with a small etching area 213. The metal material 11' is etched by using the first and second patterns 211, 212 as a mask to form the print 11 having a taper bottom. Additionally, provision of the small width's etching area between the first and second etching areas as well as the large width's etching area on the outer circumference of the second pattern, causes the difference in the etching amounts between the above areas, resulting in forming the projected portion in the print having a taper bottom. |