Photocurable composition and method of manufacturing film using the composition |
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| 申请号 | US14405929 | 申请日 | 2013-09-11 | 公开(公告)号 | US09982102B2 | 公开(公告)日 | 2018-05-29 |
| 申请人 | CANON KABUSHIKI KAISHA; | 发明人 | Toshiki Ito; Chieko Mihara; Youji Kawasaki; | ||||
| 摘要 | Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1): Rf1-Rc-X. (1) | ||||||
| 权利要求 | |||||||
| 说明书全文 | |||||||
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