PATTERNING METHODS专利检索- .使用者自己提供阻力的如对抗由身体另外一个部分提供的阻力来锻炼一个身体部件专利检索查询-专利查询网

PATTERNING METHODS
申请号	PCT/US2007021849	申请日	2007-10-12	公开(公告)号	WO2008045544A2	公开(公告)日	2008-04-17
申请人	HEWLETT PACKARD DEVELOPMENT CO; YU ZHAONING;			发明人	YU ZHAONING;
摘要	A patterning method includes providing a substrate (12) having an insulator layer (14) established thereon. A silicon layer (16) is established on the insulator layer (14). A mask (18) is established on at least a portion of the silicon layer (16). Portions of the silicon layer (16) and the insulator layer (14) are removed to expose portions of the substrate (12), whereby the silicon layer (16) and insulator layer (14) covered by the mask (18) remain on the substrate (12). The insulator layer (14, 20) is wet-etched at exposed areas, whereby a height (H) of the insulator layer (14, 20) remains substantially unchanged. The mask (18) and remaining silicon layer (16) are removed.
权利要求
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