X-ray laser microscopy sample analysis system and method专利检索- γ射线或X射线显微镜专利检索查询-专利查询网

X-ray laser microscopy sample analysis system and method
申请号	US15442670	申请日	2017-02-26	公开(公告)号	US09859029B2	公开(公告)日	2018-01-02
申请人	Rising Star Pathway, a California Corporation;			发明人	Allison Sihan Jia; Muzhi Liu; Yuhao Wang; Kevin Shaokang You; Jingyi Zhang; Zhuotong Xian;
摘要	Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. At least one sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, often using a sample administration device configured to present a plurality of samples. The sample is exposed to brief bursts of coherent X-ray illumination, often further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from the samples is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same samples can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the samples.
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