BEAM POSITION MONITOR DEVICE AND PARTICLE RAY TREATMENT DEVICE |
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| 申请号 | EP12769303 | 申请日 | 2012-01-20 | 公开(公告)号 | EP2639598A4 | 公开(公告)日 | 2015-07-01 |
| 申请人 | MITSUBISHI ELECTRIC CORP; | 发明人 | HONDA TAIZO; HARADA HISASHI; PU YUEHU; IKEDA MASAHIRO; HANAKAWA KAZUSHI; OTANI TOSHIHIRO; KATAYOSE TADASHI; YAMADA YUKIKO; | ||||
| 摘要 | The objective is to shorten the obtaining cycle for a charged particle beam irradiation position even in the case where radiations, emitted when a charged particle beam is irradiated, provide an effect. The beam position monitor (30) is provided with a plurality of position monitors (4) and a beam data processing device (11) that performs calculation processing of the state of a charged particle beam (1), based on a plurality of signals outputted from the position monitors. The beam data processing device (11) includes a plurality of channel data conversion units (21) that perform AD conversion processing of the plurality of signals outputted from the position monitors (4); a position size processing unit (23), for each of the position monitors (4), that calculates the beam position of the beam (1), based on voltage information obtained through the AD conversion processing; and an integrated control unit (40) that controls the plurality of channel data conversion units (21) in such a way that while the beam (1) is irradiated onto an irradiation subject (15), AD conversion processing of the signals is performed at different timings for the respective position monitors (4). | ||||||
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