Method for controlling plasma |
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| 申请号 | JP4147289 | 申请日 | 1989-02-21 | 公开(公告)号 | JPH02198300A | 公开(公告)日 | 1990-08-06 |
| 申请人 | Alan E Hill; | 发明人 | ARAN YUUJIN HIRU; | ||||
| 摘要 | PURPOSE: To control a thermal energy flow, and to control the shape, temperature distribution, pressure, density, and conductivity of plasma by adding heated gas. CONSTITUTION: Gas is heated by I 2 R loss in a metallic supply duct connected with a step-down transformer which supplies currents with a low voltage and the large number of amperes. The distribution to discharge of the flow of the heated gas is made excellent. A cathode surrounds this hanging edge, and forms a discharge space with an anode isolated from this. Gas or mixed gas to be used changes, for example, the adhesion and reconnection balance of ion/ electrons so that the gas or mixed gas to be used can be added to discharge. The adhering speed linearly depends on the number and density of electrons. The largest main adhesive element is air, and it moves to reconnection control so that discharge stability can be improved, current density can be increased, and electron generating efficiency can be improved. Thus, the shape, temperature distribution, pressure, density, and conductivity of plasma can be controlled. COPYRIGHT: (C)1990,JPO |
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