CHARGE STRIPPING FILM FOR CHARGE STRIPPING DEVICE OF ION BEAM |
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| 申请号 | US15783231 | 申请日 | 2017-10-13 | 公开(公告)号 | US20180102195A1 | 公开(公告)日 | 2018-04-12 |
| 申请人 | Kaneka Corporation; RIKEN; | 发明人 | Mutsuaki Murakami; Masamitsu Tachibana; Atsushi Tatami; Hiroo Hasebe; | ||||
| 摘要 | A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%. | ||||||
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| 说明书全文 | |||||||
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