| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | Washing agents containing a textile softener | US3704228D | 1970-04-16 | US3704228A | 1972-11-28 | ECKERT HANS-WERNER; PERNER JOHANNES JURGEN |
| DETERGENT COMPOSITIONS CONTAINING TEXTILE SOFTENERS CONSISTING ESSENTIALLY OF: (1) FROM 10% TO 80% BY WEIGHT OF A MIXTURE OF SURFACE-ACTIVE AGENTS CONSISTING ESSENTIALLY OF: (A) FROM 20% TO 90% BY WEIGHT OF CUSTOMARY SURFACE-ACTIVE COMPOUNDS UTILIZABLE IN NEUTRAL TO ALKALINE TEXTILE WASHING BATHS SELECTED FROM THE GROUP CONSISTING OF ANIONIC SURFACE-ACTIVE COMPOUNDS, AMPHOTERIC SURFACEACTIVE COMPOUNDS, NON-IONIC SURFACE-ACTIVE COMPOUNDS, AND MIXTURES THEREOF, WHEREIN NOT MORE THAN 50% BY WEIGHT OF SAID SURFACE-ACTIVE COMPOUNDS ARE NON-IONIC SURFACE-ACTIVE COMPOUNDS, AND (B) FROM 80% TO 10% BY WEIGHT OF A TEXTILE SOFTENER COMPOSITION OF A HIGHER FATTY ACID MONOAMIDE OF A HYDROXYLKYLPOLYAMINE, SAID HIGHER FATTY ACIDS HAVING FROM 8 TO 24 CARBON ATOMS WITH AT LEAST 50% OF SAID HIGHER FATTY ACIDS HAVING FROM 16 TO 24 CARBON ATOMS, SAID HYDROXYALKYLPOLYAMINE HAVING AT LEAST ONE HYDROXYALKYL SELECTED FROM THE GROUP CONSISTING OF HYDROXYETHYL, HYDROXYPROPYL AND DIHYDROXYPROPYL AND AT LEAST TWO HYDROGEN ATOMS BONDED TO NITROGEN ATOMS, SAID TEXTILE SOFTENER CONTAINING LESS THAN 5% BY WEIGHT OF FATTY ACID PARTIAL GLYCERIDES, AND (2) FROM 20% TO 90% BY WEIGHT OF OTHER CUSTOMARY COMPONENTS OF DETERGENT COMPOSITIONS.
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| 2 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment | US10689402 | 2003-10-20 | US20050081885A1 | 2005-04-21 | Peng Zhang; Brenda Ross |
| Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention. | ||||||
| 3 | JPS5616129B2 - | JP4658280 | 1980-04-09 | JPS5616129B2 | 1981-04-14 | |
| 4 | Preparation of emulsion of superfine fluorocarbon particle for medical use | JP4658280 | 1980-04-09 | JPS55147218A | 1980-11-17 | WATANABE RIYOUZOU; YOKOYAMA KAZUMASA; BABA TOSHIHIKO; HIRAYAMA AKIRA |
| PURPOSE: To obtain the title emulsion, stable for a long time, and having an oxygen transport ability, by emulsifying a fluorocarbon having a cyclic structure or hetero- atom with a carboxamide amine oxide-type surfactant having a perfluoroalkyl group. CONSTITUTION: (A) A fluorocarbon having at least one cyclic structure or hetero- atom in the molecule, e.g. a compound of formula I, is emulsified with (B) a carboxamide amine oxide-type surfactant, e.g. a compound of formula III, of formula II (Rf is 4W25C perfluoroalkyl group; R 1 is H or 1W6C alkyl group; R 2 is 1W6C alkylene group; R 3 and R 4 are 1W6C alkyl, 2W6C hydroxyalkyl groups, etc.) to form an emulsion comprising the superfine fluorocarbon particles of size 0.05W0.2μ having an oxygen transportability for medical use. The emulsion is usable as a substitute for blood of mammals, and also a perfusate for organ preservation. COPYRIGHT: (C)1980,JPO&Japio | ||||||
| 5 | LIQUID HAND DISHWASHING DETERGENT COMPOSITION | US12698170 | 2010-02-02 | US20100197553A1 | 2010-08-05 | Freddy Arthur Barnabas; Rafael Ortiz; Theresa Anne Gehring; Bahar Koyuncu; Katrien Decraene; Robby Renilde François Keuleers; Tania Patricia Maddox; Jean-Luc Philippe Bettiol |
| A liquid hand dishwashing detergent composition comprising a cationic polymer and a humectant, a method of cleaning dishes with a liquid hand dishwashing detergent composition comprising a cationic polymer and a humectant, and a method of providing skin hydration and/or moisturization the context of a manual dishwashing operation, using liquid hand dishwashing detergent composition comprising a cationic polymer and a humectant. | ||||||
| 6 | Lactobionic acid amide compositions and their use | US359181 | 1994-12-19 | US5525333A | 1996-06-11 | Klaus-Guenter Gerling; Sabine Joisten; Kornelia Wendler; Claudia Schreer |
| Lactobionic acid amide compositions synthesized from lactobionic acid and a mixture of primary fatty amines, which contains at least 30 percent by weight of fatty amines having a chain length of 14 to 18 carbon atoms, and their use as softening, detergent, emulsifying, foam stabilizing and/or thickening components of detergents, rinsing or cleaning agents, softeners or cosmetic formulations. | ||||||
| 7 | Lactobionic acid amide compositions and their use | US136371 | 1993-10-15 | US5401426A | 1995-03-28 | Klaus-Guenter Gerling; Sabine Joisten; Kornelia Wendler; Claudia Schreer |
| Lactobionic acid amide compositions synthesized from lactobionic acid and a mixture of primary fatty amines, which contains at least 30 percent by weight of fatty amines having a chain length of 14 to 18 carbon atoms, and their use as softening, detergent, emulsifying, foam stabilizing and/or thickening components of detergents, rinsing or cleaning agents, softeners or cosmetic formulations. | ||||||
| 8 | Process solution containing surfactant for use as treatment agent after chemical mechanical planarization | JP2009024192 | 2009-02-04 | JP2009124170A | 2009-06-04 | ZHANG PENG; ROSS BRENDA F |
| PROBLEM TO BE SOLVED: To provide a process solution for removing treatment residue from a semiconductor substrate following CMP treatment; and a method using the process solution. SOLUTION: The number of defects in manufacture of a semiconductor device is reduced using a process solution containing one or a plurality of surfactants. In some desirable embodiments, this process solution can reduce defects during CMP treatment and when it is used as a rinse solution thereafter. Further, a method of reducing the number of defects on a substrate after a plurality of CMP treatments using the process solution is disclosed. COPYRIGHT: (C)2009,JPO&INPIT | ||||||
| 9 | Process solution containing surfactant used as post-chemical mechanical planarization treatment | JP2008189176 | 2008-07-22 | JP2009021609A | 2009-01-29 | ZHANG PENG; ROSS BRENDA F |
| PROBLEM TO BE SOLVED: To provide a process solution for removing processing residuals from a semiconductor substrate following CMP processing, and a method of using the process solution. SOLUTION: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP processing. Also disclosed is a method for reducing the number of defects on a plurality of post-CMP processed substrates employing the process solution of the present invention. COPYRIGHT: (C)2009,JPO&INPIT | ||||||
| 10 | Process solution containing surfactant for use as treatment agent after chemical machinery planarization | JP2004305708 | 2004-10-20 | JP2005167206A | 2005-06-23 | ZHANG PENG; ROSS BRENDA F |
| PROBLEM TO BE SOLVED: To provide a process solution for removing treatment residue from a semiconductor substrate followed by CMP treatment and a method using the process solution. SOLUTION: The number of defects in manufacture of a semiconductor device is reduced using a process solution containing one or a plurality of surfactants. In some desirable embodiments, the process solution of the invention can reduce defects during CMP treatment and when it is used as a rinse solution thereafter. Further, a method of reducing the number of certain defects on a substrate after a plurality of CMP treatments using the process solution of the invention is disclosed. COPYRIGHT: (C)2005,JPO&NCIPI | ||||||
| 11 | Lactobionic acid amide composition, detergent, cleaning agent and/or cleansing agent and additive consisting of this composition to prepare cosmetic, and production of the composition | JP10816593 | 1993-05-10 | JPH0640846A | 1994-02-15 | KURAUSUUGIYUNTAA GEERINGU; ZABIINE YOISUTEN; KORUNERIA BUENDORAA; KURAUDEIA SHIYUREEA |
| PURPOSE: To obtain a lactobionic acid amide compsn. which is mild for skin and well biodegradable and does not contain residues of substances which cause problems about toxicity. CONSTITUTION: This lactobionic acid amide compsn. consists of an amide of a lactobionic acid as a characteristic component having effective characteristics for cleaning, stabilizing foams and/or thickening and a mixture of primary fat amines containing >=30 wt.% fat amines having chain length of 14 to 18 carbon atoms. The lactobionic acid is used for a detergent or cleaning agent compsn. which can be used for a water-based liquid, and/or for cosmetics. | ||||||
| 12 | JPS5714344B2 - | JP3128774 | 1974-03-19 | JPS5714344B2 | 1982-03-24 | |
| 13 | 有色纺织品增色洗涤剂及其制备方法 | PCT/CN2011/080297 | 2011-09-28 | WO2013044466A1 | 2013-04-04 | 宋子奎 |
一种有色纺织品增色洗涤剂及其制备方法。所述有色纺织品增色洗涤剂由以下重量份的原料构成：洗涤剂、增深剂、渗透剂、阳离子改性剂、纤维改性剂、溶纤剂、扩散剂、固色剂、匀染剂、助染剂、增白剂、漂白剂、pH值调节剂和套蓝剂。所述洗涤剂不但可以有效地固定被洗涤的有色纺织品的颜色，而且能同时增加原来颜色的深度。 |
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| 14 | Method of cleaning deposits from the engine fuel delivery system | JP2013539935 | 2011-11-15 | JP2014504307A | 2014-02-20 | − グリーン、フェリシア シンプソン; ヴォウドリン、デイモン |
| エンジン燃料送達システムの１つ又は複数の部品から堆積物を洗浄する方法であって、該エンジン燃料送達システムに（ａ）１種又は複数の芳香族炭化水素溶媒；及び（ｂ）１種又は複数のプロピレングリコールエーテルを含む洗浄組成物を導入する段階を含む方法が開示される。 | ||||||
| 15 | Composition containing a preservative for impregnating nonwoven wipe | JP16825789 | 1989-06-29 | JP2643458B2 | 1997-08-20 | DEEUITSUDO PUREGOZEN |
| 16 | Detergent composition for oven | JP14637595 | 1995-06-13 | JPH08337793A | 1996-12-24 | TAKADA NOBUYUKI; SUETAKE TAKASHI; FUKUDA MASAHIRO; TANOMURA MARI |
| PURPOSE: To obtain the subject composition simultaneously satisfying both foam property and oil stain detergency, presenting such foam property as to be foamed well and hard to be defamed and sagged esp. when sprayed on trigger spray cans, comprising a specific surfactant, an alkaline substrate, a solvent and water. CONSTITUTION: This detergent composition comprises (A) 0.1-2wt.% of a surfactant of formula I (R is an 8-20C alkyl, esp. a 11-13C alkyl), (B) 0.5-3wt.% of a compound of formula II (R 1 is a 1-4C hydroxyalkyl; R 2 is H or same as R 1; R 3 is H or a 1-4C alkyl) (e.g. monoethanolamine, N-butyl monoethanolamine), (C) 1-20wt.% of a solvent capable of dissoluting both the components A and B {e.g. compound of the formula R 4O[(C 2H 4O) m(C 3H 6O) n]H (R 4 is a 1-4C alkyl or benzene ring; (m) and (n) are each 0-3, being not zero simultaneously; the formula [ ] represents a polyoxyalkylene chain with oxyethylene groups and oxypropylene groups mutually linked randomly or in block-fashion when (m) and (n) are not zero)}, and (D) the balance water. COPYRIGHT: (C)1996,JPO | ||||||
| 17 | Composition containing antiseptic for impregnating nonwoven wipe | JP16825789 | 1989-06-29 | JPH0261000A | 1990-03-01 | DEEBUITSUDO PUREGOZEN |
| PURPOSE: To obtain an aqueous composition for impregnating a soft nonwoven wipe for purifying an organism or an inanimate matter by blending a specified compound and a specified cationic biocide to a preservative component consisting of potassium sorbate and citric acid. CONSTITUTION: An aqueous composition for impregnating nonwoven wipe which is formed of (A) about 0.02-0.25 wt.% (hereinafter referred to as %) of potassium sorbate, (B) about 0.05-0.20% of citric acid, (C) about 0.02-0.20% of disodium ethylenediaminetetraacetate, (D) about 0.03-0.24% of a cationic biocide consisting of (a) polyhexamethylene biguanide hydrochloride or (b) poly[oxyethylene(dimethyliminio)ethylene(dimethyliminio)ethylenedichloride], and (E) the remainder of water and has a pH of about 3.5-4.5 is manufactured. The compounds C and D are contained in the preservative component consisting of the compounds A and B, whereby a nonwoven wipe containing no alcohol and having no slippery feeling can be manufactured. COPYRIGHT: (C)1990,JPO | ||||||
| 18 | JPS50126620A - | JP3128774 | 1974-03-19 | JPS50126620A | 1975-10-04 | |
| 19 | JPS4822802B1 - | JP4942970 | 1970-06-08 | JPS4822802B1 | 1973-07-09 | |
| 20 | AQUEOUS CLEANING COMPOSITIONS | CA2608380 | 2006-05-10 | CA2608380A1 | 2006-11-23 | LIBRALESSO LUCA; QUAGGIA SARA; SCOIZZATO SIMONE; ZAMUNER DORA |
| An aqueous cleaning composition comprising : hydrogen peroxide or a source thereof ; an anionic sulfonate surfactant ; a fatty acid amide ; a non-ionic surfactant ; and a sarcosinate compound . | ||||||
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