Manufacture of thin-film solar cell
专利汇可以提供Manufacture of thin-film solar cell专利检索，专利查询，专利分析的服务。并且PURPOSE: To obtain a thin-film substrate which never causes a short circuit with its shape constant at the time of breaking a thin film away, by using a transparent insulating film, serving for a reflection preventive film, for an etching mask.
CONSTITUTION: On GaAl substrate 1, GaAlAs layer 2, GaAs layer 3 and GaAlAs layer 4 are epitaxy-grown in sequence. Next, upper electrode 5 which becomes ohmic is formed on it. Next, etching mask 8 of a transparent oxide such as SiO is masking-formed through vapor deposition, etc. Then, layers 4 and 3 are etched selectively in sequence. Etching mask 8' of the same transparent insulating film is also masking-formed. Layer 2 is etched and thin-film substrate 7' is peeled from substrate 1. Since etching mask 8 will not be etched by an etching solution, substrate 7' obtained in this way is constant in shape and the flank of the substrate insulated, so that no short will be caused at the flank. In addition, etching mask 8 serves for a reflection preventive film, so that the need for forming the reflection preventive film will be eliminated.
COPYRIGHT: (C)1979,JPO&Japio，下面是Manufacture of thin-film solar cell专利的具体信息内容。
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