专利汇可以提供Element structure for thin film solar cell专利检索,专利查询,专利分析的服务。并且PURPOSE: To eliminate conventional patterning by an etching step by sufficiently increasing the height of a first insulating film larger than the sum of the thicknesses of a first conductive film and a semiconductor film, and sufficiently increasing the height of a second insulating film than the sum of the thicknesses of the first conductive film, the semiconductor film and a second conductive film.
CONSTITUTION: In order to connect generating regions therebetween, a connecting member 3 having an L-shaped section is formed. A second insulating film 4 is so formed as to be brought into contact with the protruding sidewall of the member 3. The height of the film 4 from a supporting board 1 is designed to be larger than the sum of the thicknesses of a first conductive film 5, a semiconductor film 6 and a second conductive film 7. A 'film disconnection' is generated at the films 5, 6, 7 by a difference in level due to the heights of the films 2, 4 to be patterned.
COPYRIGHT: (C)1992,JPO&Japio,下面是Element structure for thin film solar cell专利的具体信息内容。
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