Acid galvanic copper bath
阅读：147发布：2023-04-04
专利汇可以提供Acid galvanic copper bath专利检索，专利查询，专利分析的服务。并且Acid aqueous electrolytes for the deposition of bright, lowtension, ductile copper coatings containing organo selenium compounds are used.，下面是Acid galvanic copper bath专利的具体信息内容。
2. In an electrolyte as set forth in claim 1, the amount of said at least one compound being not more than 0.1 g per liter of said electrolyte.
3. In an electrolyte as set forth in claim 1, said sources having respective anionic moieties selected from the group consisting of sulfate, fluoborate, and phosphate.
4. Electrolyte according to claim 1, wherein R1 is phenyl, nitrophenyl, alkylphenyl, alkoxyphenyl, carboxyphenyl, carbmethoxyphenyl, dimethylaminophenyl), alkylmercaptophenyl, aminophenyl, alkyl containing from 2 to 8 carbon atoms, benzyl, phenoxyalkyl, sulfolanyl, furyl, cyclohexylalkyl, pyridylalkyl, carboxyalkyl, dihydroxypropyl, sulfoalkyl containing 2 to 6 carbon atoms, sulfophenyl, alkoxysulfophenyl, alkylmercapto-sulfophenyl, halogen-sulfophenyl, sulfonaphthyl, di-sulfonaphthyl or sulfophenyl-alkyl, R2 is sulfoalkyl containing 2 to 6 carbon atoms, sulfophenyl, alkoxysulfophenyl, alkylmercapto-sulfophenyl, halogen-sulfophenyl, sulfonaphthyl, disulfonaphthyl or sulfophenylalkyl.
5. An electrolyte according to claim 1, wherein R1 is sulfoalkyl containing 2 to 6 carbons atoms, sulfophenyl, alkoxysulfophenyl, alkylmercapto-sulfophenyl, halogen-sulfophenyl, sulfonaphthyl, disulfonaphthyl, sulfonpheNylalkyl, R2 is the cyanide or the sulfonic acid group, and n is the number 1.
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