Exposure system for electron beam
专利汇可以提供Exposure system for electron beam专利检索，专利查询，专利分析的服务。并且PURPOSE: To make highly effective the exposure work, by adding a simple hardware to the rectrangular electron beam exposing unit and by performing repetitive exposure for the basic unit pattern given by using this.
CONSTITUTION: The electron beams from the electron gun are passed through the first and second slits 5 and 8 in which the rectangular holes are placed, and the cross section of beam can be changed by the deflection of the size varying deflector 6 present between the slits. Next, deflection is made with the alignment deflector 10 and the beams are shrinded with the electron lens 11, then the wafer 12 is radiated. With this constitution, the deflectors 6 and 10 are controlled with a new hardware. That is, the central processing unit 21 controls the basic unit pattern data memory 22, designating the size and location of the pattern. Further, based on this information, the deflectors 6 and 8 are controlled by using the registers 28,29, adders 30,31, D/A converters 32 to 35, and amplifiers 36 to 39. Thus, after the exposure of a certain types of basic unit pattern, other types of patterns are exposed, allowing to increase the working efficiency.
COPYRIGHT: (C)1979,JPO&Japio，下面是Exposure system for electron beam专利的具体信息内容。
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