专利汇可以提供Pattern detecting apparatus专利检索,专利查询,专利分析的服务。并且PURPOSE: To identify automatically a pattern whether it is formed by an inductive material or not, by irradiating a first energy beam onto a specimen receiving an energy beam issued from the irradiated part and detecting the pattern of this part.
CONSTITUTION: A laser beam from its source 10 is developed as a spot light on a wafer W set on a stage 34 through various lenses. The laser spot scans 2-dimensionally over the wafer W by scanning unit 16 and having glass 20. Scattering beams of light are observed from edges of the pattern on the wafer W. The scattering beams are collected by a photo-electric detecting apparatus 42 installed annually on the periphery of an objective lens 32. A reflected beam of light from the wafer W is detected by a photo-electric detecting apparatus 52 via an iris diaphragm 47 and a beam of fluorescent light from the pattern on the wafer W is detected by a photo-electric detecting apparatus. By these three kinds of information and the scanning informations, measurements of the pattern on the wafer W are made in a multi-angular manner.
COPYRIGHT: (C)1988,JPO&Japio,下面是Pattern detecting apparatus专利的具体信息内容。
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