Light projection apparatus and method for photoprinting
阅读：550发布：2023-06-17
专利汇可以提供Light projection apparatus and method for photoprinting专利检索，专利查询，专利分析的服务。并且Light projection apparatus and method for illuminating a mask in the photoprinting of a photosensitive material. A light source produces a light of a desired frequency range. A condensing lens system is utilized to produce a region of substantially collimated light, and an objective lens system projects an image of an imaginary surface of that region to illuminate the mask. The mask may be in or out of contact with the photosensitive material.，下面是Light projection apparatus and method for photoprinting专利的具体信息内容。
1. Light projection apparatus for illuminating a mask having selected light absorbing regions and which mask is positioned against or adjacent to a photosensitive material to illuminate selected portions of the material, comprising: a light source means for producing light of a desired frequency range; b condensing lens means for collecting light from said light source means; and c objective lens means for projecting light from said condensing lens means to illuminate said mask, said objective lens means imaging a region substantially within said condensing lens means onto said photosensitive material.
2. Apparatus according to claim 1, in which said light source means comprises a Xenon flash lamp.
3. Apparatus according to claim 1, in which said objective lens means includes a limiting aperture which is located substantially in the region where said condensing lens means forms a real image of said light source means.
4. Apparatus according to claim 3, in which the real image of said light source means substantially just fills said limiting aperture.
5. Apparatus according to claim 1, in which said objective lens means includes a limiting aperture which is located substantially in the region where said condensing lens means forms a real image of said light source means.
6. Apparatus according to claim 1, in which said condensing lens means comprises first and second condensing lenses, said first condensing lens being positioned so that said light source means is located at the primary focal point thereof and which forms an image at infinity, said second condensing lens being positioned adjacent to said first condensing lens and being substantially identical to said first condensing lens to form a real image in a magnification ratio of 1:1 at the primary focal point of the second condensing lens.
7. Apparatus according to claim 6, in which said objective lens means includes a limiting aperture located substantially at the primary focal plane of said second condensing lens.
8. Apparatus according to claim 7, in which the real image of said light source means substantially just barely fills said limiting aperture.
9. Apparatus according to claim 8, in which said objective lens means images a region substantially between said first and second condensing lenses onto said photosensitive material.
10. Apparatus according to claim 9, in which the objective lens means images said region onto said photosensitive material at a magnification ratio of substantially 1:1.
11. Apparatus according to claim 10, in which said light source means comprises a Xenon flash lamp of helical shape.
12. Apparatus according to claim 11, including a reflective mirror positioned on the side of said flash lamp opposite from said first condensing lens for reflecting light emitted by said flash lamp into the spaces between the helical turns of said flash lamp.
13. Apparatus according to claim 12, in which said objective lens means comprises an achromatic objective lens system.
14. Apparatus according to claim 13, including a mask, a photosensitive wafer, and means for holding said mask and wafer for illumination by light from said achromatic objective lens system.
15. Apparatus according to claim 14, in which said holding means is for positioning said mask against said wafer.
16. Apparatus according to claim 14, in which said holding means is for positioning said mask adjacent to but out of contact with said wafer.
17. Light projection apparatus for illuminating a mask having selected light absorbing regions and which mask is positioned against or adjacent to a photosensitive material to illuminate selected portions of the materials, comprising: a light source means for prOducing light of a desired frequency range; b first lens means for producing from light received from said source a region of substantially collimated light; and c second lens means for projecting an image of an imaginary surface in said region to illuminate said mask with light that is substantially non-collimated.
18. The method of projecting light to illuminate a mask having selected light absorbing regions and which mask is positioned against or adjacent to a photosensitive material to illuminate selected portions of the material, comprising projecting an image of an imaginary surface that is illuminated by substantially collimated light to illuminate the mask with light that is substantially non-collimated.
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