摘要 |
By configuring a timepiece component to include an intermediate film (51 a to 51 d) provided on at least a portion of a surface of a base material (11 a to 11 d) formed by using a nonconductive first material as a main component and to include a buffer film (21 a to 21 d) stacked on the intermediate film (51 a to 51 d) and mainly composed of a second material having a tenacity higher than that of the first material, the timepiece component may be manufactured with high precision, the weight thereof may be reduced, and even when the base material (11 a to 11 d) is formed by using a brittle material such as silicon, the timepiece component becomes resistant to breakage and capable of exhibiting high strength when an impact is externally applied. |