Method and System for Overlay Control |
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| 申请号 | US16042063 | 申请日 | 2018-07-23 | 公开(公告)号 | US20180329313A1 | 公开(公告)日 | 2018-11-15 |
| 申请人 | Taiwan Semiconductor Manufacturing Company, Ltd.; | 发明人 | Yang-Hung Chang; Chih-Ming Ke; Kai-Hsiung Chen; | ||||
| 摘要 | A method for overlay monitoring and control is introduced in the present disclosure. The method includes selecting a group of patterned wafers from a lot using a wafer selection model; selecting a group of fields for each of the selected group of patterned wafers using a field selection model; selecting at least one point in each of the selected group of fields using a point selection model; measuring overlay errors of the selected at least one point on a selected wafer; forming an overlay correction map using the measured overlay errors on the selected wafer; and generating a combined overlay correction map using the overlay correction map of each selected wafer in the lot. | ||||||
| 权利要求 | |||||||
| 说明书全文 | |||||||
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