首页 / 专利库 / 电气元件和设备 / 双极结型晶体管 / Semiconductor integrated circuit device

Semiconductor integrated circuit device

阅读:631发布:2023-03-19

专利汇可以提供Semiconductor integrated circuit device专利检索,专利查询,专利分析的服务。并且PURPOSE:To increase the integration and the performance of a semiconductor integrated circuit device by forming a buried layer of a bipolar device of oxidized film isolation type in a configuration that a low density region is formed on a high density layer, thereby reducing the creep-up of the buried layer into an epitaxial layer. CONSTITUTION:After a high density N type buried layer 2 is formed in a region forming, for example, a transistor of a P type substrate 1, a P type epitaxial layer 3 of higher density than the substrate 1 is formed on the surface. Then, the second buried layer 4 of lower density than the layer 2 is formed on the layer 2 in the layer 3, and an N type layer 5 is epitaxially grown. Subsequently, an oxidized film 6 is formed on the isolated region, a base region 7, an emitter region 8 and a collector contact region 8' are then formed, an electrode 9 is formed, and an IC device is formed. Thus, the low density region 4 is formed on the layer 2, thereby reducing the creep-up of the buried layer, and accordingly the device in which the epitaxial layer 5 is reduced in thickness can be formed.,下面是Semiconductor integrated circuit device专利的具体信息内容。

高效检索全球专利

专利汇是专利免费检索,专利查询,专利分析-国家发明专利查询检索分析平台,是提供专利分析,专利查询,专利检索等数据服务功能的知识产权数据服务商。

我们的产品包含105个国家的1.26亿组数据,免费查、免费专利分析。

申请试用

分析报告

专利汇分析报告产品可以对行业情报数据进行梳理分析,涉及维度包括行业专利基本状况分析、地域分析、技术分析、发明人分析、申请人分析、专利权人分析、失效分析、核心专利分析、法律分析、研发重点分析、企业专利处境分析、技术处境分析、专利寿命分析、企业定位分析、引证分析等超过60个分析角度,系统通过AI智能系统对图表进行解读,只需1分钟,一键生成行业专利分析报告。

申请试用

QQ群二维码
意见反馈