Electron beam exposing equipment
专利汇可以提供Electron beam exposing equipment专利检索，专利查询，专利分析的服务。并且PURPOSE:To obtain a highly accurate and highly reliable electron beam whose form and dimensions are controlled, by a method wherein a discrepancy of an axial direction of a cross-over of an electron beam is detected and compensated. CONSTITUTION:An aperture image of an electron beam formed by the first beam forming aperture 3 is deflected and projected on the second beam forming aperture 6 and an electron beam with variable dimensions is obtained by superposing the first aperture image and the second aperture image. When the larger dimension and the shorten dimension of the electron beam are variably controlled, a deviation of an edge image regulated by the second aperture 6 is previously measured. The focus distance is adjusted by changing a driving current of a condensor lense 2 according to the deviation and the position of the cross over image is always kept at the center of a light polarizing system 4 by negative feedback control.，下面是Electron beam exposing equipment专利的具体信息内容。
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