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Positive type photoresist composition

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专利汇可以提供Positive type photoresist composition专利检索,专利查询,专利分析的服务。并且PURPOSE:To provide high sensitivity and to decrease film thinning in an unexposed part in the stage of development by using and alkali soluble phenolic resin as a base resin and incorporating the condensation product of p-alkyl phenol, etc., as a photodecomposable compd. in a title compsn. CONSTITUTION:First the p-alkyl phenol or p-alkoxy phenol or p-phenyl is subjected to heating and addition condensation in an org. solvent such as formaldehyde in an N2 atmosphere in the presence of an alkaline catalyst such as potassium hydroxide to obtain the cyclic addition condensation product. Such condensation product and o-quinonediazide sulfonyl chloride are condensed in an org. solvent such as N-N-dimethyl acetamide or N,N-dimethylformamide dioxane with an alkali such as pyridine as a catalyst by which the photodecomposable compd. is obtd. The compd. obtd. in such a manner is incorporated into the compsn., by which the high sensitivity and the curve B of the exposing time shorter than the curve of the exposing time of a commercially marketed compsn. A are obtd. The film thinning in the exposed part in the stage of development is thus decreased.,下面是Positive type photoresist composition专利的具体信息内容。

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