Photomask automatic defect inspection device
专利汇可以提供Photomask automatic defect inspection device专利检索，专利查询，专利分析的服务。并且PURPOSE:To improve the reliability of inspection by employing a photomask comprising a false defect pattern which is preset in advance so as to adjust an automatic defect inspection device in the optimum state. CONSTITUTION:A pattern of a photomask 1 is exposed onto a dummy wafer 11 and after transfer the pattern, the wafer is put on a movable table 12 and chip patterns 2 and 3 are detected and recognized by detection optical systems 13, 14 facing to each other and a detection circuit 15. The obtained electric signals are compared with a threshold value Vth in a comparison circuit 21 thereby detecting false defects. Then the chip patterns 2 and 3 are compared mutually in the contrast circuit 22 so as to recognize respective false defects 8 and 9 and that an automatic defect inspection device 10 is adjusted correctly is displayed by a display 25. If the false defect 8 or 9 is not detected in the comparison circuit 21, a slice level adjustor 23 operates to do the detection in the comparison circuit 21 again while changing the threshold value Vth gradually.，下面是Photomask automatic defect inspection device专利的具体信息内容。
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