Semiconductor ic device

阅读:28发布:2023-03-20

专利汇可以提供Semiconductor ic device专利检索,专利查询,专利分析的服务。并且PURPOSE:To contrive stabilization of a characteristic of the IC by a method wherein an SiO2 film is removed at a part corresponding to an annular hole surrounding MOS capacity and burried with a material preventing movable ions. CONSTITUTION:An N-epitaxial layer on a P type Si substrate having an N -burried layer is isolated by a P layer to form islands. The island 12A is provided with a bipolar transistor T and at the same time, the island 12B is provided with the MOS capacity C. A part 18a where the SiO2 film 18 formed on the top surface of the N-epitaxial layer corresponds to the N layer 17 is made thin and forms a hole RH in circular by surrounding the part where the capacity C is arranged. An SiO2 19 of P-dope is reservoired and the film 19 is perforated an opening on the part 18a at the same time when each connection hole is formed, and the film 19 is remained within the hole RH. Then, Al electrodes 20-24 are formed to make the NPN transistor T and the MOS capacity C be completed. With this construction, since Na- ions are prevented to move by the P-doped SiO2 film in the hole RH even the ions invading the SiO2 film 18a, the transistor characteristic is stabilized.,下面是Semiconductor ic device专利的具体信息内容。

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